@Article{RossiUedaBarr:2001:PlImIo,
               author = "Rossi, Jos{\'e} Oswaldo and Ueda, Mario and Barroso, Joaquim 
                         Jose",
          affiliation = "Instituto Nacional de Pesquisas Espaciais, Laborat{\'o}rio 
                         Associado de Plasmas, (INPE, LAP)",
                title = "Plasma immersion ion implantation experiments with long and short 
                         rise time pulses using high voltage hard tube pulser",
              journal = "Surface and Coatings Technology",
                 year = "2001",
               volume = "136",
                pages = "43--46",
             keywords = "High voltage pulse generator, Plasma immersion implantation, Rise 
                         and fall times of high voltage pulses.",
             abstract = "The performances of two high voltage pulse generators using 
                         different circuit configurations for the treatment of metals and 
                         polymer materials by plasma immersion ion implantation are 
                         assessed. Both pulse generators were built in the circuit category 
                         of hard tube type which uses a high power tetrode as a fast on]off 
                         switch to control the pulse duration. The first pulse generator 
                         has . a maximum capacity of 60 kVr10 A at a repetition frequency 
                         of 700 Hz with a long pulse rise time of the order of 40 ms while 
                         the second one is able to operate with full voltage and current of 
                         30 kV and 30 A at 1 kHz with a very short pulse rise time less . 
                         than 1 ms . It is shown that the better performance of the latter 
                         pulser in terms of rise time is due to a different configuration 
                         circuit employed in its construction. Target voltage and 
                         implantation current from the application of both pulsers to a 
                         plasma glow discharge are discussed using a stationary plasma 
                         circuit model.",
           copyholder = "SID/SCD",
                 issn = "0257-8972",
             language = "en",
           targetfile = "63.pdf",
        urlaccessdate = "04 maio 2024"
}